例句與造句

1. photo-induced catalytic characteristics of tio2 thin films deposited by dc reactive magnetron sputtering
   直流反應(yīng)磁控濺射制備二氧化鈦薄膜的光催化性研究
2. ultrathin aluminum films were prepared by dc reactive magnetron sputtering . the target was made by 99.999 % pure aluminum
   采用直流磁控濺射法濺射純度為99.999%的鋁靶制備了超薄鋁膜。
3. in the first part of the thesis tin film in different n2 partial pressure prepared by reactive magnetron sputtering is studied
   本文首先研究了磁控濺射法在不同氮?dú)夥謮合滤苽涞膖in薄膜。
4. the results indicate that it has an excellent surface . aln thin film was prepared from an aluminum target by dc and af reactive magnetron sputtering in nitrogen gas mixed with argon gas
   氮化鋁薄膜樣品是利用高純鋁靶,在氮?dú)饧託鍤鈿夥障掠弥绷骱蜕漕l反應(yīng)磁控濺射法制備的。
5. three kinds of different methods, namely anode oxidation, micro-arc oxidation and dc reactive magnetron sputtering, were employed to treat aluminum substrate which is used for power electronic devices in order to get an insulating surface by form a layer of aluminum nitride ( aln ) or aluminum oxide ( al2o3 ) film
   本文分別采用陽(yáng)極氧化法、微弧氧化法和磁控反應(yīng)濺射沉積氮化鋁薄膜的方法對(duì)功率電子器件用金屬鋁基板表面進(jìn)行絕緣化處理。
6. It's difficult to find reactive magnetron sputtering in a sentence. 用reactive magnetron sputtering造句挺難的
7. firstly, the tio2 thin films are deposited by dc reactive magnetron sputtering apparatus, and characterlized by n & k analyzer1200, x-ray diffraction spectroscopy ( xrd ), scanning electronic microscopy ( sem ), alpha-step500 . and it was analyzed that the effect on performance and structure of films with the change of argon flow, total gas pressure, the substrate-to-target distance and temperature
   第一、應(yīng)用穩(wěn)定的直流磁控濺射設(shè)備制備tio2減反射薄膜并通過(guò)n&kanalyzer1200薄膜光學(xué)分析儀、x射線衍射分析(xrd)、掃描電子顯微鏡(sem)、alpha-step500型臺(tái)階儀等儀器對(duì)薄膜進(jìn)行表征,分析氧分壓、總氣壓、工作溫度、靶基距等制備工藝參數(shù)對(duì)薄膜性能結(jié)構(gòu)的影響。
8. because of it is not sensitive to hydrogen at normal temperature, so tungsten oxide with doped catalyst to improving its hydrogen response was adopted . the tungsten oxide films with pt and pdcl2 catalyst were prepared with sol-gel and dc reactive magnetron sputtering methods . simultaneously the optical property and surface structure of the catalyst films was studied
   由于三氧化鎢薄膜在常溫下對(duì)氫氣不敏感,本文采用摻雜改性來(lái)改善三氧化鎢薄膜材料的氫敏性能,分別采用直流磁控濺射法和溶膠凝膠法制備了均勻的三氧化鎢摻鉑和摻鈀薄膜材料,并對(duì)它的光學(xué)性質(zhì)、表面形態(tài)、結(jié)構(gòu)等進(jìn)行了深入的研究。